FEI Company, a provider of atomic-scale imaging and analysis systems, and Sematech, the global consortium of chipmakers, announced that FEI has joined Sematech’s Advanced Metrology Development Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany, US. As a member of this program, FEI will collaborate with experts to develop high-resolution capabilities of transmission electron microscopy (TEM) analysis, with electron energy loss spectroscopy (EELS) and focused ion beam (FIB) technology to address critical needs in process development and defect analysis.
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