SPIE Europe Optics and Optoelectronics

April 16, 2009

New applications for EUV, VUV, and x-ray technologies and other topics in photonics will be among highlights of SPIE Europe Optics and Optoelectronics to be held April 20-23, 2009 in Prague, Czech Republic. Approximately 450 papers will be presented in 10 technical conferences on:

- Harnessing Relativistic Plasma Waves as Novel Radiation Sources from Terahertz to X-rays and Beyond
- EUV and X-ray Optics: Synergy between Laboratory and Space
- Damage to VUV, EUV, and X-ray Optics
- Metamaterials
- Nonlinear Optics and Applications
- Photon Counting Applications
- Quantum Optics and Quantum Information Transfer and Processing
- Optical Sensors
- Photonic Crystal Fibres
- Holography: Advances in Classical Holography and Modern Trends

www.spie.org/optics-optoelectronics.xml

Prague, Czech Republic (source: pixelio.de)

Prague, Czech Republic (source: pixelio.de)


Ultra Clean to Manufacture Products for FEI

Februar 5, 2009

Ultra Clean Technology and FEI Company have signed a global supplier agreement under which Ultra Clean will provide hosted manufacturing services in the FEI Hillsboro, Ore., US facility. It is also anticipated that Ultra Clean’s Asia operations will be utilized to produce some FEI sub-assemblies. The two companies are targeting the first quarter of 2009 for transfer of current product lines to Ultra Clean operations.
www.uct.com
www.fei.com


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